Atomic hydrogen cleaning of GaSb(001) surfaces

Atomic hydrogen cleaning of GaSb(001) surfaces

Atomic Hydrogen Cleaning of Semiconductor Photocathodes

Negative Electron Affinity (NEA) semiconductor photocathodes are widely used for the production of polarized electron beams, and are also useful for the production of high brightness electron beams which can be modulated at very high frequencies. Preparation of an atomically clean semiconductor surface is an essential step in the fabrication of a NEA photocathode. This cleaning step is difficul...

Atomic Hydrogen Cleaning of InP(100): Electron Yield and Surface Morphology of Negative Electron Affinity Activated Surfaces

This Article is brought to you for free and open access by the Electrical & Computer Engineering at ODU Digital Commons. It has been accepted for inclusion in Electrical & Computer Engineering Faculty Publications by an authorized administrator of ODU Digital Commons. For more information, please contact [email protected]. Repository Citation Hafez, M. A. and Elsayed-Ali, H. E., "Atomic Hy...

Plasma Cleaning of Surfaces

Plasma cleaning of solid surfaces is one of the hot topics of the very fast developing field of plasma treatment of materials. Plasma cleaning has been implemented already in several industries such as semiconductor processing and microchip fabrication, metallurgy, the optical industry, dentistry, medical technologies, food packaging – to name just the most important areas. Understanding the ba...

In-situ non-disruptive cleaning of Ge(100) using H2O2(g) and atomic hydrogen